プラズマCVD（PECVD）
PECVD-8-16 Batch Wafer PECVD Pilot System
モデルPECVD-8-16
A capacitively coupled plasma deposition system uses a multi-slot graphite boat to process up to twelve 6-inch wafers in one heated quartz-tube batch.
Wafer capacity
12 x 6 in wafers
Working temperature
400–1100 °C
Heating zones
3 x 300 mm; uniform zone 600 mm (±2 °C)
- 最終構成は見積前に確認
- 用途に応じてカスタムと付属品を確認
- 輸出梱包と書類は必要に応じて対応
技術データ
技術仕様
仕様はシステム別に整理され、設備タイプごとに重要なパラメータを表示します。
Key specifications
| Wafer capacity | 12 x 6 in wafers |
|---|---|
| Working temperature | 400–1100 °C |
| Heating zones | 3 x 300 mm; uniform zone 600 mm (±2 °C) |
| RF plasma source | 20–1000 W; 13.56 MHz |
| Gas control | 4 MFC channels; ±1.5% FS |
仕様は構成やカスタム内容により変更される場合があります。最終データは確認済み見積に従います。
製品説明
A compatible vacuum pump is required and is specified separately.
Confirm precursor or sample compatibility, tube and flange configuration, gases, pumping, cooling, exhaust and electrical supply with LabSova before ordering. Images may show optional accessories; the agreed configuration defines supply. Temperature ratings do not imply that every vacuum or pressure condition is permitted at that temperature.
発注前に調達条件を確認できます。
要件を確認
海外購入者向けに、構成、付属品、梱包方法、輸出書類、検査写真または動画、出荷条件を見積確認に含められます。
関連設備
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