プラズマCVD（PECVD）
OTF-1200X-PEC4LV Four-Gas PECVD Tube Furnace
モデルOTF-1200X-PEC4LV
A compact split-tube PECVD system for thin films and nanowire research, with adjustable RF power, four-gas mixing and integrated mechanical vacuum.
Operating temperature
1100 °C continuous; 1200 °C for <60 min
Heating zone
440 mm; uniform zone 150 mm
Quartz tube options
2 or 3.14 in OD; 48 in length
- 最終構成は見積前に確認
- 用途に応じてカスタムと付属品を確認
- 輸出梱包と書類は必要に応じて対応
技術データ
技術仕様
仕様はシステム別に整理され、設備タイプごとに重要なパラメータを表示します。
Key specifications
| Operating temperature | 1100 °C continuous; 1200 °C for <60 min |
|---|---|
| Heating zone | 440 mm; uniform zone 150 mm |
| Quartz tube options | 2 or 3.14 in OD; 48 in length |
| RF plasma source | 5–300 W; 13.56 MHz |
| Gas control | 4 MFC channels; touchscreen control |
仕様は構成やカスタム内容により変更される場合があります。最終データは確認済み見積に従います。
製品説明
Confirm precursor or sample compatibility, tube and flange configuration, gases, pumping, cooling, exhaust and electrical supply with LabSova before ordering. Images may show optional accessories; the agreed configuration defines supply. Temperature ratings do not imply that every vacuum or pressure condition is permitted at that temperature.
発注前に調達条件を確認できます。
要件を確認
海外購入者向けに、構成、付属品、梱包方法、輸出書類、検査写真または動画、出荷条件を見積確認に含められます。
関連設備
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