プラズマCVD（PECVD）
OTF-1200X-S-II-PEC4 Compact Rotary Hybrid Plasma CVD System
モデルOTF-1200X-S-II-PEC4
A short-zone rotary furnace integrates solid-source evaporation, RF plasma and four-gas mixing for powder coating studies at continuous temperatures up to 1000 °C.
Operating temperature
1000 °C continuous; 1100 °C for <1 h
Heating zones
2 x 100 mm
RF plasma source
5–300 W; 13.56 MHz
- 最終構成は見積前に確認
- 用途に応じてカスタムと付属品を確認
- 輸出梱包と書類は必要に応じて対応
技術データ
技術仕様
仕様はシステム別に整理され、設備タイプごとに重要なパラメータを表示します。
Key specifications
| Operating temperature | 1000 °C continuous; 1100 °C for <1 h |
|---|---|
| Heating zones | 2 x 100 mm |
| RF plasma source | 5–300 W; 13.56 MHz |
| Source crucible | 0.7 mL alumina crucible with tungsten heater |
| Gas control | 4 MFC channels: 0–100, 0–200, 0–200, 0–500 sccm |
仕様は構成やカスタム内容により変更される場合があります。最終データは確認済み見積に従います。
製品説明
Confirm precursor or sample compatibility, tube and flange configuration, gases, pumping, cooling, exhaust and electrical supply with LabSova before ordering. Images may show optional accessories; the agreed configuration defines supply. Temperature ratings do not imply that every vacuum or pressure condition is permitted at that temperature.
発注前に調達条件を確認できます。
要件を確認
海外購入者向けに、構成、付属品、梱包方法、輸出書類、検査写真または動画、出荷条件を見積確認に含められます。
関連設備
同カテゴリのその他製品
OTF-1200X-II-PEC4 Rotary Plasma-Enhanced Hybrid CVD Furnace
OTF-1200X-S50-PESL Compact Sliding PECVD Tube Furnace
OTF-1200X-S-II-PECVD Compact Rotary Powder PECVD Furnace
OTF1200XSDFPESL Dual-Sliding PECVD Deposition Furnace
OTF-1200X-II-50-PEMSL Auto-Sliding PECVD Furnace with Preheater
OTF-1200X-II-PEC4SL-LD Sliding Multi-Zone PECVD Workstation
OTF-1200X-PEC4LV Four-Gas PECVD Tube Furnace
