プラズマCVD（PECVD）
OTF-1200X-III-R5-PECVD Continuous-Feed Rotary Powder PECVD Furnace
モデルOTF-1200X-III-R5-PECVD
A rotary plasma CVD furnace with automatic powder dosing and sealed collection for surface coating and core-shell particle research. Rotation and tilt control powder movement through the hot zone.
Operating temperature
Working ≤1100 °C; maximum 1200 °C
Heating zones
150 + 300 + 150 mm
Rotation and tilt
2–10 rpm; 0–15°
- 最終構成は見積前に確認
- 用途に応じてカスタムと付属品を確認
- 輸出梱包と書類は必要に応じて対応
技術データ
技術仕様
仕様はシステム別に整理され、設備タイプごとに重要なパラメータを表示します。
Key specifications
| Operating temperature | Working ≤1100 °C; maximum 1200 °C |
|---|---|
| Heating zones | 150 + 300 + 150 mm |
| Rotation and tilt | 2–10 rpm; 0–15° |
| Powder capacity | 5 L tumbling volume; recommended loading 1–1.25 L |
| RF plasma source | 5–300 W; 13.56 MHz |
| Powder feed rate | 0–97 mL/min, estimated |
仕様は構成やカスタム内容により変更される場合があります。最終データは確認済み見積に従います。
製品説明
Confirm precursor or sample compatibility, tube and flange configuration, gases, pumping, cooling, exhaust and electrical supply with LabSova before ordering. Images may show optional accessories; the agreed configuration defines supply. Temperature ratings do not imply that every vacuum or pressure condition is permitted at that temperature.
発注前に調達条件を確認できます。
要件を確認
海外購入者向けに、構成、付属品、梱包方法、輸出書類、検査写真または動画、出荷条件を見積確認に含められます。
関連設備
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