化学気相成長（CVD）
OTF-1200X-Mist Four-Gas Mist CVD Growth Furnace
モデルOTF-1200X-Mist
A mist-assisted film-growth furnace with a 400 mm heating zone, ultrasonic atomization and four-channel mass-flow delivery for precursor and carrier-gas studies.
Maximum temperature
1200 °C
Heating zone
400 mm; 125 mm uniform zone
Quartz tube
60 mm OD x 54 mm ID x 1000 mm L
- 最終構成は見積前に確認
- 用途に応じてカスタムと付属品を確認
- 輸出梱包と書類は必要に応じて対応
技術データ
技術仕様
仕様はシステム別に整理され、設備タイプごとに重要なパラメータを表示します。
Key specifications
| Maximum temperature | 1200 °C |
|---|---|
| Heating zone | 400 mm; 125 mm uniform zone |
| Quartz tube | 60 mm OD x 54 mm ID x 1000 mm L |
| Atomization and feed | 1.7 MHz; 0.004–70 mL/min |
| Gas control | 4 MFC channels, 0–500 mL/min; ±0.2% FS |
仕様は構成やカスタム内容により変更される場合があります。最終データは確認済み見積に従います。
製品説明
Confirm precursor or sample compatibility, tube and flange configuration, gases, pumping, cooling, exhaust and electrical supply with LabSova before ordering. Images may show optional accessories; the agreed configuration defines supply. Temperature ratings do not imply that every vacuum or pressure condition is permitted at that temperature.
発注前に調達条件を確認できます。
要件を確認
海外購入者向けに、構成、付属品、梱包方法、輸出書類、検査写真または動画、出荷条件を見積確認に含められます。
関連設備
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