化学気相成長（CVD）
OTF-1200X-HVC3-series High-Vacuum CVD Furnace Workstation
モデルOTF-1200X-HVC3-series
A quartz-tube CVD workstation combining programmable heating, three-gas mixing and high-vacuum pumping for deposition, diffusion and atmosphere-controlled thermal processing.
Operating temperature
1100 °C continuous; 1200 °C maximum
Heating zone
440 mm; uniform zone 150 mm (±1 °C)
Temperature program
30 segments; ±1 °C
- 最終構成は見積前に確認
- 用途に応じてカスタムと付属品を確認
- 輸出梱包と書類は必要に応じて対応
技術データ
技術仕様
仕様はシステム別に整理され、設備タイプごとに重要なパラメータを表示します。
Key specifications
| Operating temperature | 1100 °C continuous; 1200 °C maximum |
|---|---|
| Heating zone | 440 mm; uniform zone 150 mm (±1 °C) |
| Temperature program | 30 segments; ±1 °C |
| System vacuum | Down to 1 x 10^-4 Torr, with specified sealing assembly |
| Furnace power | 208–240 V AC, single phase; 2.5 kW |
仕様は構成やカスタム内容により変更される場合があります。最終データは確認済み見積に従います。
製品説明
Confirm precursor or sample compatibility, tube and flange configuration, gases, pumping, cooling, exhaust and electrical supply with LabSova before ordering. Images may show optional accessories; the agreed configuration defines supply. Temperature ratings do not imply that every vacuum or pressure condition is permitted at that temperature.
発注前に調達条件を確認できます。
要件を確認
海外購入者向けに、構成、付属品、梱包方法、輸出書類、検査写真または動画、出荷条件を見積確認に含められます。
関連設備
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