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Chemical Vapor Deposition (CVD)

OTF-1200X-HVC3-series High-Vacuum CVD Furnace Workstation

ModelOTF-1200X-HVC3-series

A quartz-tube CVD workstation combining programmable heating, three-gas mixing and high-vacuum pumping for deposition, diffusion and atmosphere-controlled thermal processing.

Operating temperature 1100 °C continuous; 1200 °C maximum
Heating zone 440 mm; uniform zone 150 mm (±1 °C)
Temperature program 30 segments; ±1 °C
  • Final configuration confirmed before quotation
  • Customization and accessories reviewed by application
  • Export packing and documentation available on request
Technical data

Technical specifications

Specifications are organized by system so different equipment types can present the parameters that matter for their application.

Key specifications

Operating temperature 1100 °C continuous; 1200 °C maximum
Heating zone 440 mm; uniform zone 150 mm (±1 °C)
Temperature program 30 segments; ±1 °C
System vacuum Down to 1 x 10^-4 Torr, with specified sealing assembly
Furnace power 208–240 V AC, single phase; 2.5 kW

Specifications may change with configuration and customization. Final data is subject to the confirmed quotation.

Product description

Confirm precursor or sample compatibility, tube and flange configuration, gases, pumping, cooling, exhaust and electrical supply with LabSova before ordering. Images may show optional accessories; the agreed configuration defines supply. Temperature ratings do not imply that every vacuum or pressure condition is permitted at that temperature.