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Chemical Vapor Deposition (CVD)

OTF-1200X-S-Mist Compact Ultrasonic Mist CVD Furnace

ModelOTF-1200X-S-Mist

A short-zone mist CVD platform combining ultrasonic precursor atomization with a heated quartz tube and angled holders for small substrates.

Maximum temperature 1200 °C
Heating zone 200 mm; 60 mm uniform zone
Quartz tube 60 mm OD x 55 mm ID x 600 mm L
  • Final configuration confirmed before quotation
  • Customization and accessories reviewed by application
  • Export packing and documentation available on request
Technical data

Technical specifications

Specifications are organized by system so different equipment types can present the parameters that matter for their application.

Key specifications

Maximum temperature 1200 °C
Heating zone 200 mm; 60 mm uniform zone
Quartz tube 60 mm OD x 55 mm ID x 600 mm L
Atomization frequency 1.7 MHz
Liquid feed rate 0.004–70 mL/min
Substrate arrangement 4 substrates, 10 x 10 x 0.5 mm; 45° holder

Specifications may change with configuration and customization. Final data is subject to the confirmed quotation.

Product description

Confirm precursor or sample compatibility, tube and flange configuration, gases, pumping, cooling, exhaust and electrical supply with LabSova before ordering. Images may show optional accessories; the agreed configuration defines supply. Temperature ratings do not imply that every vacuum or pressure condition is permitted at that temperature.