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Chemical Vapor Deposition (CVD)

OTF1200XSF2 Compact Two-Gas CVD Tube Furnace

ModelOTF1200XSF2

A small quartz-tube furnace for laboratory CVD and controlled-atmosphere heating, with two adjustable gas channels and a 200 mm heated section.

Operating temperature 1100 °C continuous; 1200 °C for <1 h
Quartz tube 50 mm OD x 43 mm ID x 450 mm L
Heating zone 200 mm; uniform zone 60 mm at 900 °C
  • Final configuration confirmed before quotation
  • Customization and accessories reviewed by application
  • Export packing and documentation available on request
Technical data

Technical specifications

Specifications are organized by system so different equipment types can present the parameters that matter for their application.

Key specifications

Operating temperature 1100 °C continuous; 1200 °C for <1 h
Quartz tube 50 mm OD x 43 mm ID x 450 mm L
Heating zone 200 mm; uniform zone 60 mm at 900 °C
Gas channels 2 channels; 16–100 mL/min each
Temperature program 30 segments; ±1 °C

Specifications may change with configuration and customization. Final data is subject to the confirmed quotation.

Product description

Confirm precursor or sample compatibility, tube and flange configuration, gases, pumping, cooling, exhaust and electrical supply with LabSova before ordering. Images may show optional accessories; the agreed configuration defines supply. Temperature ratings do not imply that every vacuum or pressure condition is permitted at that temperature.