OTF-1200X-III-HPCVD-S3 Three-Zone Hybrid Deposition Furnace
A large-bore hybrid PVD/CVD platform for sequential deposition and co-evaporation studies, with three independently heated zones and separately controlled source feed channels.
- 最終構成は見積前に確認
- 用途に応じてカスタムと付属品を確認
- 輸出梱包と書類は必要に応じて対応
技術仕様
仕様はシステム別に整理され、設備タイプごとに重要なパラメータを表示します。
Key specifications
| Operating temperature | 100–1100 °C continuous; 1200 °C for <1 h |
|---|---|
| Heating zones | 3 x 300 mm |
| Main quartz tube | 130 mm OD x 122 mm ID x 1200 mm L |
| Gas control | 4 channels with PLC touchscreen |
| Power supply | 208–240 V AC, single phase; 10 kW |
仕様は構成やカスタム内容により変更される場合があります。最終データは確認済み見積に従います。
製品説明
The number and motion of source feed channels require confirmation for the selected configuration.
Confirm precursor or sample compatibility, tube and flange configuration, gases, pumping, cooling, exhaust and electrical supply with LabSova before ordering. Images may show optional accessories; the agreed configuration defines supply. Temperature ratings do not imply that every vacuum or pressure condition is permitted at that temperature.
海外購入者向けに、構成、付属品、梱包方法、輸出書類、検査写真または動画、出荷条件を見積確認に含められます。
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