OTF-1200X-III-HPCVD-S3 Three-Zone Hybrid Deposition Furnace
A large-bore hybrid PVD/CVD platform for sequential deposition and co-evaporation studies, with three independently heated zones and separately controlled source feed channels.
- Final configuration confirmed before quotation
- Customization and accessories reviewed by application
- Export packing and documentation available on request
Technical specifications
Specifications are organized by system so different equipment types can present the parameters that matter for their application.
Key specifications
| Operating temperature | 100–1100 °C continuous; 1200 °C for <1 h |
|---|---|
| Heating zones | 3 x 300 mm |
| Main quartz tube | 130 mm OD x 122 mm ID x 1200 mm L |
| Gas control | 4 channels with PLC touchscreen |
| Power supply | 208–240 V AC, single phase; 10 kW |
Specifications may change with configuration and customization. Final data is subject to the confirmed quotation.
Product description
The number and motion of source feed channels require confirmation for the selected configuration.
Confirm precursor or sample compatibility, tube and flange configuration, gases, pumping, cooling, exhaust and electrical supply with LabSova before ordering. Images may show optional accessories; the agreed configuration defines supply. Temperature ratings do not imply that every vacuum or pressure condition is permitted at that temperature.
For international buyers, quotation confirmation can include configuration, accessories, packing method, export documents, inspection photos or videos and shipping terms.
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