VTC-1RF-SPC Hybrid Magnetron Sputtering and Thermal Evaporation System
A stainless-steel chamber combines a magnetron source and a temperature-controlled evaporation crucible for complementary deposition processes.
- Final configuration confirmed before quotation
- Customization and accessories reviewed by application
- Export packing and documentation available on request
Key product features
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Sputtering source options: 500 W DC or 300 W RF, 13.56 MHz
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Maximum evaporation temperature: 1350 °C
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Chamber size: Ø250 × 360 mm
Technical specifications
Specifications are organized by system so different equipment types can present the parameters that matter for their application.
Key specifications
| Sputtering source options | 500 W DC or 300 W RF, 13.56 MHz |
|---|---|
| Maximum evaporation temperature | 1350 °C |
| Chamber size | Ø250 × 360 mm |
| Sample stage diameter | 100 mm |
| Maximum stage temperature | 700 °C |
| Specified cold base pressure | 8 × 10^-6 Torr |
Specifications may change with configuration and customization. Final data is subject to the confirmed quotation.
Confirm target materials, substrate dimensions, power sources, vacuum pumps, cooling and gas requirements with LabSova. Optional components and laboratory utilities must be specified separately.
For international buyers, quotation confirmation can include configuration, accessories, packing method, export documents, inspection photos or videos and shipping terms.
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