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Thin Film Deposition Equipment

VTC-16-3HD-LD Three-Target Rotary Plasma Sputtering Coater

ModelVTC-16-3HD-LD

Three coating positions and touchscreen control support successive metallic coatings without manually repositioning the sample.

Target size Ø47 mm; thickness ≤2.5 mm
Output 1600 V DC; 40 mA max.
Chamber inner size Ø150 × 150 mm
  • Final configuration confirmed before quotation
  • Customization and accessories reviewed by application
  • Export packing and documentation available on request
Equipment features

Key product features

  • Target size: Ø47 mm; thickness ≤2.5 mm

  • Output: 1600 V DC; 40 mA max.

  • Chamber inner size: Ø150 × 150 mm

Technical data

Technical specifications

Specifications are organized by system so different equipment types can present the parameters that matter for their application.

Key specifications

Target size Ø47 mm; thickness ≤2.5 mm
Output 1600 V DC; 40 mA max.
Chamber inner size Ø150 × 150 mm
Sample stage Ø50 mm; 3 coating positions
Target distance 25–40 mm
Optional stage heater Up to 500 °C

Specifications may change with configuration and customization. Final data is subject to the confirmed quotation.

Confirm target materials, substrate dimensions, power sources, vacuum pumps, cooling and gas requirements with LabSova. Optional components and laboratory utilities must be specified separately.