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Thin Film Deposition Equipment

VTC-3HD-VP Three-Head RF/DC Powder Coater with Gas Purification

ModelVTC-3HD-VP

Three magnetron sources, a vibrating powder stage and gas purification support coating research with moisture-sensitive powders.

Sputtering heads 3 × 1 in; water cooled
Source ratings 500 W DC; 300 W RF at 13.56 MHz
Suggested powder volume 5–20 mL
  • Final configuration confirmed before quotation
  • Customization and accessories reviewed by application
  • Export packing and documentation available on request
Equipment features

Key product features

  • Sputtering heads: 3 × 1 in; water cooled

  • Source ratings: 500 W DC; 300 W RF at 13.56 MHz

  • Suggested powder volume: 5–20 mL

Technical data

Technical specifications

Specifications are organized by system so different equipment types can present the parameters that matter for their application.

Key specifications

Sputtering heads 3 × 1 in; water cooled
Source ratings 500 W DC; 300 W RF at 13.56 MHz
Suggested powder volume 5–20 mL
Suggested particle size 1–1000 µm
Chamber inner size Ø238 × 276 mm
Purified atmosphere O2 <1 ppm; H2O <1 ppm

Specifications may change with configuration and customization. Final data is subject to the confirmed quotation.

Confirm target materials, substrate dimensions, power sources, vacuum pumps, cooling and gas requirements with LabSova. Optional components and laboratory utilities must be specified separately.