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Thin Film Deposition Equipment

VTC-3RF Three-Head RF Magnetron Coater with Heated Rotating Stage

ModelVTC-3RF

Three 1-inch sources allow sequential coating under vacuum, while the heated rotating stage supports thin-film process development.

Sputtering heads 3 × 1 in
Standard RF supply 100 W; 13.5 MHz; manual matching
Target distance 50–80 mm
  • Final configuration confirmed before quotation
  • Customization and accessories reviewed by application
  • Export packing and documentation available on request
Equipment features

Key product features

  • Sputtering heads: 3 × 1 in

  • Standard RF supply: 100 W; 13.5 MHz; manual matching

  • Target distance: 50–80 mm

Technical data

Technical specifications

Specifications are organized by system so different equipment types can present the parameters that matter for their application.

Key specifications

Sputtering heads 3 × 1 in
Standard RF supply 100 W; 13.5 MHz; manual matching
Target distance 50–80 mm
Stage diameter 50 mm
Stage rotation 1–10 rpm
Stage heating limits 600 °C for ≤5 min; 500 °C for ≤2 h

Specifications may change with configuration and customization. Final data is subject to the confirmed quotation.

Confirm target materials, substrate dimensions, power sources, vacuum pumps, cooling and gas requirements with LabSova. Optional components and laboratory utilities must be specified separately.