化学気相成長（CVD）
OTF-1200X-4-III-9HV Nine-Gas High-Vacuum CVD Furnace
モデルOTF-1200X-4-III-9HV
A three-zone quartz-tube workstation for multi-gas deposition studies, integrating nine mass-flow channels with programmable heating and high-vacuum pumping.
Operating temperature
1100 °C continuous; 1200 °C maximum
Heating zones
220 + 440 + 220 mm
Quartz tube
100 mm OD x 92 mm ID x 1400 mm L
- 最終構成は見積前に確認
- 用途に応じてカスタムと付属品を確認
- 輸出梱包と書類は必要に応じて対応
技術データ
技術仕様
仕様はシステム別に整理され、設備タイプごとに重要なパラメータを表示します。
Key specifications
| Operating temperature | 1100 °C continuous; 1200 °C maximum |
|---|---|
| Heating zones | 220 + 440 + 220 mm |
| Quartz tube | 100 mm OD x 92 mm ID x 1400 mm L |
| Gas control | 9 MFC channels; ±1.5% FS; ranges configured by channel |
| Furnace power | 208–240 V AC, single phase; 7 kW max |
仕様は構成やカスタム内容により変更される場合があります。最終データは確認済み見積に従います。
製品説明
Confirm precursor or sample compatibility, tube and flange configuration, gases, pumping, cooling, exhaust and electrical supply with LabSova before ordering. Images may show optional accessories; the agreed configuration defines supply. Temperature ratings do not imply that every vacuum or pressure condition is permitted at that temperature.
発注前に調達条件を確認できます。
要件を確認
海外購入者向けに、構成、付属品、梱包方法、輸出書類、検査写真または動画、出荷条件を見積確認に含められます。
関連設備
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