化学気相成長（CVD）
MIST-1600-6 Induction-Heated Mist LPCVD Reactor
モデルMIST-1600-6
A quartz-chamber deposition reactor with an induction-heated graphite stage for high-temperature thin-film growth on wafers up to 6 inches.
Operating temperature
1500 °C working; 1600 °C for <1 h
Wafer capacity
Up to 6 in
Quartz chamber
216 mm OD x 500 mm H
- 最終構成は見積前に確認
- 用途に応じてカスタムと付属品を確認
- 輸出梱包と書類は必要に応じて対応
技術データ
技術仕様
仕様はシステム別に整理され、設備タイプごとに重要なパラメータを表示します。
Key specifications
| Operating temperature | 1500 °C working; 1600 °C for <1 h |
|---|---|
| Wafer capacity | Up to 6 in |
| Quartz chamber | 216 mm OD x 500 mm H |
| Induction supply | 15 kW; 30–100 kHz |
| Heated precursor vessel | 100 mL; up to 150 °C |
仕様は構成やカスタム内容により変更される場合があります。最終データは確認済み見積に従います。
製品説明
Confirm precursor or sample compatibility, tube and flange configuration, gases, pumping, cooling, exhaust and electrical supply with LabSova before ordering. Images may show optional accessories; the agreed configuration defines supply. Temperature ratings do not imply that every vacuum or pressure condition is permitted at that temperature.
発注前に調達条件を確認できます。
要件を確認
海外購入者向けに、構成、付属品、梱包方法、輸出書類、検査写真または動画、出荷条件を見積確認に含められます。
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