B2B laboratory equipment sourcing Supplier coordination · Technical clarification · Export support
Thin Film Deposition Equipment

VTC-600-3HD-GB Glovebox-Integrated Three-Source Sputtering System

ModelVTC-600-3HD-GB

Three 2-inch sputtering sources combine with a purified glovebox for handling and coating air-sensitive materials.

Glovebox chamber 1200 × 740 × 900 mm
Purified atmosphere O2 <1 ppm; H2O <1 ppm
Sputtering heads 3 × 2 in
  • Final configuration confirmed before quotation
  • Customization and accessories reviewed by application
  • Export packing and documentation available on request
Equipment features

Key product features

  • Glovebox chamber: 1200 × 740 × 900 mm

  • Purified atmosphere: O2 <1 ppm; H2O <1 ppm

  • Sputtering heads: 3 × 2 in

Technical data

Technical specifications

Specifications are organized by system so different equipment types can present the parameters that matter for their application.

Key specifications

Glovebox chamber 1200 × 740 × 900 mm
Purified atmosphere O2 <1 ppm; H2O <1 ppm
Sputtering heads 3 × 2 in
Source configuration 2 × 500 W DC + 1 × 300 W RF (13.56 MHz)
Deposition chamber Ø300 × 300 mm
Sample stage Ø140 mm; 1–20 rpm; up to 500 °C

Specifications may change with configuration and customization. Final data is subject to the confirmed quotation.

The illustration shows the three-head sputtering module, not the complete glovebox. DC/RF supplies and glovebox integration require configuration confirmation.

Confirm target materials, substrate dimensions, power sources, vacuum pumps, cooling and gas requirements with LabSova. Optional components and laboratory utilities must be specified separately.