HVMSS-SPC-2F Adjustable 2-Inch Magnetron Sputtering Source
A water-cooled source component for custom sputtering systems, with a tilting head and quick vacuum connection; not a complete coater.
- Final configuration confirmed before quotation
- Customization and accessories reviewed by application
- Export packing and documentation available on request
Key product features
-
Target diameter: 50.8 mm
-
Maximum input power: 500 W DC; 300 W RF
-
Head tilt: ±25°
Technical specifications
Specifications are organized by system so different equipment types can present the parameters that matter for their application.
Key specifications
| Target diameter | 50.8 mm |
|---|---|
| Maximum input power | 500 W DC; 300 W RF |
| Head tilt | ±25° |
| Sputtering voltage | 200–1000 V |
| Operating pressure | 1–1000 mTorr |
| Cooling-water requirement | 0.8 GPM; inlet <20 °C |
Specifications may change with configuration and customization. Final data is subject to the confirmed quotation.
Confirm target materials, substrate dimensions, power sources, vacuum pumps, cooling and gas requirements with LabSova. Optional components and laboratory utilities must be specified separately.
For international buyers, quotation confirmation can include configuration, accessories, packing method, export documents, inspection photos or videos and shipping terms.
More from this category
VTC-16-D Compact DC Sputter Coater for SEM Sample Preparation
View details →
GSL-1100X-SPC-16C-LD Combined Sputter and Carbon Evaporation Coater
View details →
VTC-16-3HD-LD Three-Target Rotary Plasma Sputtering Coater
View details →
VTC-16-SM 250 W DC Magnetron Coater with Rotating Stage
View details →
VTC-STX-XX Compact 2-Inch Magnetron Coater with DC or RF Options
View details →
VTC-16-PW DC Magnetron Powder Coater with Vibrating Sample Cup
View details →
VTC-3HD-VP Three-Head RF/DC Powder Coater with Gas Purification
View details →