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実験室用研削・研磨装置

UNIPOL-1503 Automated 15-Inch Wafer Polisher with Thickness Control

モデルUNIPOL-1503

UNIPOL-1503 combines a 15-inch platen, three 4-inch sample stations and Bluetooth-enabled thickness control. A PLC and 10-inch touchscreen coordinate plate rotation and swing motion for automated wafer polishing.

Plate diameter 15 inches
Plate speed 0–120 rpm
Sample stations 3 stations, each for a 4-inch sample
  • 最終構成は見積前に確認
  • 用途に応じてカスタムと付属品を確認
  • 輸出梱包と書類は必要に応じて対応
代表的な用途
  • Automated wafer polishing
  • Thickness-controlled laboratory specimen preparation
設備の特徴

主な製品特徴

  • Three workstations for 4-inch specimens

  • Bluetooth-enabled thickness control

  • PLC and 10-inch touchscreen interface

技術データ

技術仕様

仕様はシステム別に整理され、設備タイプごとに重要なパラメータを表示します。

Key specifications

Plate diameter 15 inches
Plate speed 0–120 rpm
Sample stations 3 stations, each for a 4-inch sample
Control PLC with 10-inch touchscreen
Thickness control Bluetooth-enabled thickness control
Swing frequency Up to 10 cycles/min
Power supply 208–240 V AC, 50/60 Hz, 10 A; 110 V option on request
Shipping dimensions 1030 x 790 x 1050 mm

仕様は構成やカスタム内容により変更される場合があります。最終データは確認済み見積に従います。

Confirm thickness-control sensors and slurry equipment in the final configuration. Do not assume optional thickness-checking accessories are included.

Images may show optional accessories. Confirm voltage, holders, consumables and included items in the final quotation.