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Thin Film Deposition Equipment

RF-600-LD 600 W RF Power Supply for Plasma Process Systems

ModelRF-600-LD

An RF supply for a 50-ohm load, available in specified frequency versions for integration into plasma process equipment.

Maximum forward power 600 W into 50 Ω
Frequency versions 400 kHz; 2, 13.56, 27.12, 40.68 or 60 MHz
Frequency stability ±0.005%
  • Final configuration confirmed before quotation
  • Customization and accessories reviewed by application
  • Export packing and documentation available on request
Equipment features

Key product features

  • Maximum forward power: 600 W into 50 Ω

  • Frequency versions: 400 kHz; 2, 13.56, 27.12, 40.68 or 60 MHz

  • Frequency stability: ±0.005%

Technical data

Technical specifications

Specifications are organized by system so different equipment types can present the parameters that matter for their application.

Key specifications

Maximum forward power 600 W into 50 Ω
Frequency versions 400 kHz; 2, 13.56, 27.12, 40.68 or 60 MHz
Frequency stability ±0.005%
Rise time <200 ms
AC input 208 V; single phase
Dimensions 216 × 134 × 469 mm

Specifications may change with configuration and customization. Final data is subject to the confirmed quotation.

Confirm target materials, substrate dimensions, power sources, vacuum pumps, cooling and gas requirements with LabSova. Optional components and laboratory utilities must be specified separately.