化学気相成長（CVD）
OTF-1200X-II-F3LV Dual-Zone CVD Furnace with Three-Gas Control
モデルOTF-1200X-II-F3LV
Two independently controlled heating zones create a longer uniform region or a thermal gradient in an 80 mm quartz tube, with gas mixing and mechanical pumping integrated below.
Operating temperature
1100 °C continuous; 1200 °C maximum
Quartz tube
80 mm OD x 72 mm ID x 1000 mm L
Heating zones
2 x 200 mm; 250 mm uniform zone at equal settings
- 最終構成は見積前に確認
- 用途に応じてカスタムと付属品を確認
- 輸出梱包と書類は必要に応じて対応
技術データ
技術仕様
仕様はシステム別に整理され、設備タイプごとに重要なパラメータを表示します。
Key specifications
| Operating temperature | 1100 °C continuous; 1200 °C maximum |
|---|---|
| Quartz tube | 80 mm OD x 72 mm ID x 1000 mm L |
| Heating zones | 2 x 200 mm; 250 mm uniform zone at equal settings |
| Gas flow ranges | 3 channels: 10–100, 16–160, 25–250 cc/min |
| Temperature control | 2 controllers; 30 segments each; ±1 °C |
仕様は構成やカスタム内容により変更される場合があります。最終データは確認済み見積に従います。
製品説明
Confirm precursor or sample compatibility, tube and flange configuration, gases, pumping, cooling, exhaust and electrical supply with LabSova before ordering. Images may show optional accessories; the agreed configuration defines supply. Temperature ratings do not imply that every vacuum or pressure condition is permitted at that temperature.
発注前に調達条件を確認できます。
要件を確認
海外購入者向けに、構成、付属品、梱包方法、輸出書類、検査写真または動画、出荷条件を見積確認に含められます。
関連設備
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