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Chemical Vapor Deposition (CVD)

OTF-1200X-III-RR Roll-to-Roll CVD Film-Growth Furnace

ModelOTF-1200X-III-RR

A continuous-feed CVD furnace transports flexible substrates through three heated zones, with separate supply and collection chambers and adjustable foil tension.

Operating temperature 1100 °C continuous; 1200 °C for <60 min
Heating zones 150 + 300 + 150 mm
Quartz tube 100 mm OD x 1400 mm L
  • Final configuration confirmed before quotation
  • Customization and accessories reviewed by application
  • Export packing and documentation available on request
Technical data

Technical specifications

Specifications are organized by system so different equipment types can present the parameters that matter for their application.

Key specifications

Operating temperature 1100 °C continuous; 1200 °C for <60 min
Heating zones 150 + 300 + 150 mm
Quartz tube 100 mm OD x 1400 mm L
Transport speed 1–400 mm/min
Tension adjustment 0–1000 g

Specifications may change with configuration and customization. Final data is subject to the confirmed quotation.

Product description

Confirm precursor or sample compatibility, tube and flange configuration, gases, pumping, cooling, exhaust and electrical supply with LabSova before ordering. Images may show optional accessories; the agreed configuration defines supply. Temperature ratings do not imply that every vacuum or pressure condition is permitted at that temperature.