化学気相成長（CVD）
GSL-1100X-III-D11 Large-Area Dual-Tube Graphene CVD Furnace
モデルGSL-1100X-III-D11
Concentric quartz tubes support metal-foil substrates for large-area graphene growth. A manual extractor withdraws the inner tube after processing to assist film handling.
Operating temperature
1100 °C continuous; 1200 °C for <1 h
Heating zones
3 x 410 mm; 1230 mm total
Outer quartz tube
280 mm OD x 270 mm ID x 2070 mm L
- 最終構成は見積前に確認
- 用途に応じてカスタムと付属品を確認
- 輸出梱包と書類は必要に応じて対応
技術データ
技術仕様
仕様はシステム別に整理され、設備タイプごとに重要なパラメータを表示します。
Key specifications
| Operating temperature | 1100 °C continuous; 1200 °C for <1 h |
|---|---|
| Heating zones | 3 x 410 mm; 1230 mm total |
| Outer quartz tube | 280 mm OD x 270 mm ID x 2070 mm L |
| Inner quartz tube | 254 mm OD x 244 mm ID x 2310 mm L |
| Power supply | 220 V AC, three phase; 24 kW max |
仕様は構成やカスタム内容により変更される場合があります。最終データは確認済み見積に従います。
製品説明
Confirm precursor or sample compatibility, tube and flange configuration, gases, pumping, cooling, exhaust and electrical supply with LabSova before ordering. Images may show optional accessories; the agreed configuration defines supply. Temperature ratings do not imply that every vacuum or pressure condition is permitted at that temperature.
発注前に調達条件を確認できます。
要件を確認
海外購入者向けに、構成、付属品、梱包方法、輸出書類、検査写真または動画、出荷条件を見積確認に含められます。
関連設備
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