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Chemical Vapor Deposition (CVD)

OTF-1200X-S-50-DFSL Dual-Sliding Thermal CVD Furnace

ModelOTF-1200X-S-50-DFSL

Two independently movable furnaces share a long quartz tube, allowing separate source and deposition heating positions for thermal CVD experiments.

Operating temperature 1100 °C continuous; 1200 °C for <1 h
Heated sections 2 x 200 mm
Quartz tube 50 mm OD x 44 mm ID x 1500 mm L
  • Final configuration confirmed before quotation
  • Customization and accessories reviewed by application
  • Export packing and documentation available on request
Technical data

Technical specifications

Specifications are organized by system so different equipment types can present the parameters that matter for their application.

Key specifications

Operating temperature 1100 °C continuous; 1200 °C for <1 h
Heated sections 2 x 200 mm
Quartz tube 50 mm OD x 44 mm ID x 1500 mm L
Temperature program Independent 30-segment control
Furnace power 1.2 kW each; 2.4 kW total

Specifications may change with configuration and customization. Final data is subject to the confirmed quotation.

Product description

Confirm precursor or sample compatibility, tube and flange configuration, gases, pumping, cooling, exhaust and electrical supply with LabSova before ordering. Images may show optional accessories; the agreed configuration defines supply. Temperature ratings do not imply that every vacuum or pressure condition is permitted at that temperature.