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Chemical Vapor Deposition (CVD)

OTF-1200X-80-F3LV-PTFE Corrosion-Resistant CVD Furnace System

ModelOTF-1200X-80-F3LV-PTFE

A single-zone CVD furnace with PTFE flanges and gas mixing, plus a cold trap ahead of the pump for processes involving condensable or corrosive precursors.

Operating temperature 1100 °C continuous; 1200 °C maximum
Quartz tube 80 mm OD x 75 mm ID x 1000 mm L
Heating zone 400 mm; uniform zone 150 mm
  • Final configuration confirmed before quotation
  • Customization and accessories reviewed by application
  • Export packing and documentation available on request
Technical data

Technical specifications

Specifications are organized by system so different equipment types can present the parameters that matter for their application.

Key specifications

Operating temperature 1100 °C continuous; 1200 °C maximum
Quartz tube 80 mm OD x 75 mm ID x 1000 mm L
Heating zone 400 mm; uniform zone 150 mm
Gas-contact components PTFE flanges and three-channel mixer
Vacuum pumping 156 L/min two-stage rotary vane pump with cold trap

Specifications may change with configuration and customization. Final data is subject to the confirmed quotation.

Product description

Confirm precursor or sample compatibility, tube and flange configuration, gases, pumping, cooling, exhaust and electrical supply with LabSova before ordering. Images may show optional accessories; the agreed configuration defines supply. Temperature ratings do not imply that every vacuum or pressure condition is permitted at that temperature.