VTC-600-2HD-LD Dual-Source RF/DC Magnetron Thin-Film Coater
Two independently powered 2-inch sources combine with a heated rotating substrate stage and dual gas-flow control.
- Final configuration confirmed before quotation
- Customization and accessories reviewed by application
- Export packing and documentation available on request
Key product features
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Sputtering heads: 2 × 2 in
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Source ratings: 500 W DC; 300 W RF, 13.56 MHz
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Chamber size: Ø300 × 300 mm
Technical specifications
Specifications are organized by system so different equipment types can present the parameters that matter for their application.
Key specifications
| Sputtering heads | 2 × 2 in |
|---|---|
| Source ratings | 500 W DC; 300 W RF, 13.56 MHz |
| Chamber size | Ø300 × 300 mm |
| Stage diameter | 140 mm |
| Stage rotation and heat | 1–20 rpm; up to 500 °C |
| Gas controllers | 2 MFCs; 0–200 sccm, N2 calibrated |
Specifications may change with configuration and customization. Final data is subject to the confirmed quotation.
Confirm target materials, substrate dimensions, power sources, vacuum pumps, cooling and gas requirements with LabSova. Optional components and laboratory utilities must be specified separately.
For international buyers, quotation confirmation can include configuration, accessories, packing method, export documents, inspection photos or videos and shipping terms.
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