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Thin Film Deposition Equipment

VTC-150-H Hybrid PVD/CVD Coating Platform with Vertical Furnace

ModelVTC-150-H

A vertical tube-furnace platform integrates magnetron sputtering with a rotating sample holder for combined deposition studies.

Furnace temperature rating 1100 °C
Tube diameter 5 in
Sputtering head 1 in; water cooled
  • Final configuration confirmed before quotation
  • Customization and accessories reviewed by application
  • Export packing and documentation available on request
Equipment features

Key product features

  • Furnace temperature rating: 1100 °C

  • Tube diameter: 5 in

  • Sputtering head: 1 in; water cooled

Technical data

Technical specifications

Specifications are organized by system so different equipment types can present the parameters that matter for their application.

Key specifications

Furnace temperature rating 1100 °C
Tube diameter 5 in
Sputtering head 1 in; water cooled
Target distance 60–100 mm
Sample holder 3 in diameter; 1–10 rpm
Electrical supply 208–240 V AC, 50/60 Hz; 3000 W

Specifications may change with configuration and customization. Final data is subject to the confirmed quotation.

Confirm target materials, substrate dimensions, power sources, vacuum pumps, cooling and gas requirements with LabSova. Optional components and laboratory utilities must be specified separately.