B2B laboratory equipment sourcing Supplier coordination · Technical clarification · Export support
Thin Film Deposition Equipment

OTF-1200X-RTP-II-CSS-300 12-Inch CSS/RTP Furnace with Rotating Substrate Holder

ModelOTF-1200X-RTP-II-CSS-300

A stainless-steel vacuum furnace with dual infrared heaters and a rotating 12-inch substrate holder for thin-film thermal processing.

Substrate diameter 12 in
Maximum heater temperature 950 °C
Chamber inner size Ø500 × 460 mm
  • Final configuration confirmed before quotation
  • Customization and accessories reviewed by application
  • Export packing and documentation available on request
Equipment features

Key product features

  • Substrate diameter: 12 in

  • Maximum heater temperature: 950 °C

  • Chamber inner size: Ø500 × 460 mm

Technical data

Technical specifications

Specifications are organized by system so different equipment types can present the parameters that matter for their application.

Key specifications

Substrate diameter 12 in
Maximum heater temperature 950 °C
Chamber inner size Ø500 × 460 mm
Holder rotation 1–10 rpm
Heater spacing 2–25 mm
Maximum power requirement 60 kW; three phase

Specifications may change with configuration and customization. Final data is subject to the confirmed quotation.

Confirm the evaporation material, source compatibility, substrate dimensions, vacuum level and electrical configuration with LabSova. Equipment and accessories are supplied according to the agreed configuration.