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Plasma-Enhanced CVD (PECVD)

OTF-1200X-S-II-PECVD Compact Rotary Powder PECVD Furnace

ModelOTF-1200X-S-II-PECVD

A two-zone rotary PECVD system keeps powders moving during plasma-assisted heating for surface treatment and coating research. Rotation and flange options require configuration confirmation.

Operating temperature 1000 °C continuous; 1100 °C for <1 h
Heating zones 2 x 100 mm; 200 mm total
RF plasma source 5–300 W; 13.56 MHz
  • Final configuration confirmed before quotation
  • Customization and accessories reviewed by application
  • Export packing and documentation available on request
Technical data

Technical specifications

Specifications are organized by system so different equipment types can present the parameters that matter for their application.

Key specifications

Operating temperature 1000 °C continuous; 1100 °C for <1 h
Heating zones 2 x 100 mm; 200 mm total
RF plasma source 5–300 W; 13.56 MHz
Temperature control 2 independent 30-segment programs; ±1 °C
Furnace power 208–240 V AC, single phase; 1.5 kW max

Specifications may change with configuration and customization. Final data is subject to the confirmed quotation.

Product description

Confirm precursor or sample compatibility, tube and flange configuration, gases, pumping, cooling, exhaust and electrical supply with LabSova before ordering. Images may show optional accessories; the agreed configuration defines supply. Temperature ratings do not imply that every vacuum or pressure condition is permitted at that temperature.