OTF-1200X-ALD Plasma-Assisted Tube ALD Furnace
A dual-zone tube platform for plasma-assisted atomic layer deposition, combining controlled heating with a 13.56 MHz RF source. ALD valve and gas-delivery options are configured to the process.
- Final configuration confirmed before quotation
- Customization and accessories reviewed by application
- Export packing and documentation available on request
Technical specifications
Specifications are organized by system so different equipment types can present the parameters that matter for their application.
Key specifications
| Continuous temperature | 1100 °C |
|---|---|
| Heating zones | 2 x 200 mm; 400 mm total |
| RF plasma source | 5–300 W; 13.56 MHz |
| Quartz processing tube | 50 mm OD x 44 mm ID x 2200 mm L |
| Optional ALD valves | 2 valves; minimum pulse 10 ms |
Specifications may change with configuration and customization. Final data is subject to the confirmed quotation.
Product description
Confirm precursor or sample compatibility, tube and flange configuration, gases, pumping, cooling, exhaust and electrical supply with LabSova before ordering. Images may show optional accessories; the agreed configuration defines supply. Temperature ratings do not imply that every vacuum or pressure condition is permitted at that temperature.
For international buyers, quotation confirmation can include configuration, accessories, packing method, export documents, inspection photos or videos and shipping terms.
