ALD-800X-4-PE Rotating-Stage Plasma ALD Reactor
A quartz-chamber ALD reactor with a rotating 4-inch stage and heated precursor delivery for thin-film research. Recommended stage operation is below 550 °C; RF and valve configuration require confirmation.
- Final configuration confirmed before quotation
- Customization and accessories reviewed by application
- Export packing and documentation available on request
Technical specifications
Specifications are organized by system so different equipment types can present the parameters that matter for their application.
Key specifications
| Sample stage | 4 in diameter; 0–5 rpm |
|---|---|
| Recommended stage temperature | Below 550 °C; stated accuracy ±5 °C |
| Quartz chamber | 165 mm OD x 150 mm ID x 250 mm H |
| Heated bubblers | 2 x 150 mL |
| Minimum valve pulse | 10 ms |
Specifications may change with configuration and customization. Final data is subject to the confirmed quotation.
Product description
Confirm precursor or sample compatibility, tube and flange configuration, gases, pumping, cooling, exhaust and electrical supply with LabSova before ordering. Images may show optional accessories; the agreed configuration defines supply. Temperature ratings do not imply that every vacuum or pressure condition is permitted at that temperature.
For international buyers, quotation confirmation can include configuration, accessories, packing method, export documents, inspection photos or videos and shipping terms.
