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Thin Film Deposition Equipment

HVHP-100 100 mm Vacuum-Compatible Heating Plate with PID Control

ModelHVHP-100

A FeCrAl-heated substrate plate for coating-system integration, with a K-type sensor and programmable temperature profiles.

Heating area diameter 100 mm
Temperature limit 800 °C max.; <8 h
Power rating 850 W
  • Final configuration confirmed before quotation
  • Customization and accessories reviewed by application
  • Export packing and documentation available on request
Equipment features

Key product features

  • Heating area diameter: 100 mm

  • Temperature limit: 800 °C max.; <8 h

  • Power rating: 850 W

Technical data

Technical specifications

Specifications are organized by system so different equipment types can present the parameters that matter for their application.

Key specifications

Heating area diameter 100 mm
Temperature limit 800 °C max.; <8 h
Power rating 850 W
AC input 110–120 V, 50/60 Hz
Recommended ramp rate 5 °C/min
Temperature program 30 segments; ±1 °C

Specifications may change with configuration and customization. Final data is subject to the confirmed quotation.

Confirm the evaporation material, source compatibility, substrate dimensions, vacuum level and electrical configuration with LabSova. Equipment and accessories are supplied according to the agreed configuration.