OTF-1200X-4-NW-UL Solid-Precursor CVD Tube Furnace
A split-tube CVD furnace with a separate solid-source heater and multiple gas inlets for nanowire and thin-film growth experiments.
- Final configuration confirmed before quotation
- Customization and accessories reviewed by application
- Export packing and documentation available on request
Technical specifications
Specifications are organized by system so different equipment types can present the parameters that matter for their application.
Key specifications
| Operating temperature | 200–1000 °C continuous; 1100 °C for <2 h |
|---|---|
| Quartz tube | 110 mm OD x 103 mm ID x 740 mm L |
| Heating zone | 440 mm; uniform zone 100 mm |
| Sample holder | 3 in |
| Temperature program | 30 segments; ±1 °C |
Specifications may change with configuration and customization. Final data is subject to the confirmed quotation.
Product description
Confirm precursor or sample compatibility, tube and flange configuration, gases, pumping, cooling, exhaust and electrical supply with LabSova before ordering. Images may show optional accessories; the agreed configuration defines supply. Temperature ratings do not imply that every vacuum or pressure condition is permitted at that temperature.
For international buyers, quotation confirmation can include configuration, accessories, packing method, export documents, inspection photos or videos and shipping terms.
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