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Chemical Vapor Deposition (CVD)

OTF-1200X-III-80-F3LV Three-Zone CVD Furnace with Gas Mixing

ModelOTF-1200X-III-80-F3LV

A long heated-tube system for CVD and diffusion research, using three independent zones and an 80 mm quartz tube with integrated three-gas mixing.

Operating temperature 1100 °C continuous; 1200 °C maximum
Heating zones 220 + 440 + 220 mm; 880 mm total
Quartz tube 80 mm OD x 72 mm ID x 1400 mm L
  • Final configuration confirmed before quotation
  • Customization and accessories reviewed by application
  • Export packing and documentation available on request
Technical data

Technical specifications

Specifications are organized by system so different equipment types can present the parameters that matter for their application.

Key specifications

Operating temperature 1100 °C continuous; 1200 °C maximum
Heating zones 220 + 440 + 220 mm; 880 mm total
Quartz tube 80 mm OD x 72 mm ID x 1400 mm L
Gas flow ranges 3 channels: 10–100, 16–160, 25–250 cc/min
Vacuum pump 120 L/min rotary vane pump; stated system vacuum 10^-2 Torr

Specifications may change with configuration and customization. Final data is subject to the confirmed quotation.

Product description

Confirm precursor or sample compatibility, tube and flange configuration, gases, pumping, cooling, exhaust and electrical supply with LabSova before ordering. Images may show optional accessories; the agreed configuration defines supply. Temperature ratings do not imply that every vacuum or pressure condition is permitted at that temperature.