B2B laboratory equipment sourcing Supplier coordination · Technical clarification · Export support
Chemical Vapor Deposition (CVD)

GSL-1100X-III-D11 Large-Area Dual-Tube Graphene CVD Furnace

ModelGSL-1100X-III-D11

Concentric quartz tubes support metal-foil substrates for large-area graphene growth. A manual extractor withdraws the inner tube after processing to assist film handling.

Operating temperature 1100 °C continuous; 1200 °C for <1 h
Heating zones 3 x 410 mm; 1230 mm total
Outer quartz tube 280 mm OD x 270 mm ID x 2070 mm L
  • Final configuration confirmed before quotation
  • Customization and accessories reviewed by application
  • Export packing and documentation available on request
Technical data

Technical specifications

Specifications are organized by system so different equipment types can present the parameters that matter for their application.

Key specifications

Operating temperature 1100 °C continuous; 1200 °C for <1 h
Heating zones 3 x 410 mm; 1230 mm total
Outer quartz tube 280 mm OD x 270 mm ID x 2070 mm L
Inner quartz tube 254 mm OD x 244 mm ID x 2310 mm L
Power supply 220 V AC, three phase; 24 kW max

Specifications may change with configuration and customization. Final data is subject to the confirmed quotation.

Product description

Confirm precursor or sample compatibility, tube and flange configuration, gases, pumping, cooling, exhaust and electrical supply with LabSova before ordering. Images may show optional accessories; the agreed configuration defines supply. Temperature ratings do not imply that every vacuum or pressure condition is permitted at that temperature.