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Chemical Vapor Deposition (CVD)

LVD-F1 Temperature-Controlled CVD Liquid Vaporizer

ModelLVD-F1

A compact liquid-delivery accessory for laboratory CVD, using adjustable liquid feed and inert carrier gas to introduce vaporized precursors into a process system.

Liquid feed 1–82 mL/min; stated tolerance ±1 mL/min
Carrier gas flow 200–2000 mL/min
Vapor outlet fitting 1/4 in OD
  • Final configuration confirmed before quotation
  • Customization and accessories reviewed by application
  • Export packing and documentation available on request
Technical data

Technical specifications

Specifications are organized by system so different equipment types can present the parameters that matter for their application.

Key specifications

Liquid feed 1–82 mL/min; stated tolerance ±1 mL/min
Carrier gas flow 200–2000 mL/min
Vapor outlet fitting 1/4 in OD
Power supply 220 V, 50/60 Hz; 2500 W

Specifications may change with configuration and customization. Final data is subject to the confirmed quotation.

Product description

Confirm precursor or sample compatibility, tube and flange configuration, gases, pumping, cooling, exhaust and electrical supply with LabSova before ordering. Images may show optional accessories; the agreed configuration defines supply. Temperature ratings do not imply that every vacuum or pressure condition is permitted at that temperature.